A novel material for next generation MEMS and Sensor Devices Project
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| Field | Value |
|---|---|
| Groups |
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| Tags |
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| isopen | False |
| license_id | us-pd |
| license_title | us-pd |
| maintainer | TECHPORT SUPPORT |
| maintainer_email | hq-techport@mail.nasa.gov |
| metadata_created | 2025-12-01T16:55:14.967414 |
| metadata_modified | 2025-12-01T16:55:14.967418 |
| notes | <p>Our goal is to build a PS etching cell and determine how different fabrication parameters affect its thermal properties. We aim to demonstrate a very low thermal conductivity, capable for use in bolometers. Build an in-house capability to fabricate porous silicon on the detector development lab Study methods for selective etching of porous silicon (ion implantation) to enable structures for MEMS devices and detectors. Test the thermal conductivity of porous silicon<br /> </p> <p>We will work with the University of Maryland to design a single tank etching cell Etch porous silicon under different conditions and develop a method to characterize physical properties. Create fabrication processes that involve ion implantation and silicon-on-insulator wafers. Study the thermal conductivity<br /> </p> |
| num_resources | 4 |
| num_tags | 8 |
| title | A novel material for next generation MEMS and Sensor Devices Project |